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193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process

Author(s):
Ferri, J.E. ( Arch Chemicals, Inc. (Belgium) )
Vieira, M. ( Arch Chemicals, Inc. (Belgium) )
Reybrouck, M. ( Arch Chemicals, Inc. (Belgium) )
Mastovich, M.E. ( Schlumberger Ltd. (USA) )
Bowdoin, S. ( Schlumberger Ltd. (USA) )
Brandom, R. ( Schlumberger Ltd. (USA) )
Knutrud, P.C. ( Schlumberger Ltd. (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
608
Page(to):
617
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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