Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Author(s):

Chen, L.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Yu, S.S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Chen, P. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Ku, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

Engelhard, D. ( Timbre Technologies, Inc. (USA) )

Hetzer, D. ( Timbre Technologies, Inc. (USA) )

Yang, J.Y. ( Timbre Technologies, Inc. (USA) )

Barry, K.A. ( Timbre Technologies, Inc. (USA) )

Yap, L. ( Timbre Technologies, Inc. (USA) )

Yang, W. ( Timbre Technologies, Inc. (USA) )

8 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5038

Pub. Year:

2003

Vol.:

1

Page(from):

568

Page(to):

576

Pages:

9

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448439 [0819448435]

Language:

English

Call no.:

P63600/5038

Type:

Conference Proceedings

Details

TDL ID:	ZA00013025
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2003 : 17th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.24-2003.02.27
Note for article:	Scatterometry II ; 5038-60

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