Characterization of photoresist spatial resolution by interferometric lithography
- Author(s):
- Hoffnagle, J.A. ( IBM Almaden Research Ctr. (USA) )
- Hinsberg, W.D. ( IBM Almaden Research Ctr. (USA) )
- Houle, F.A. ( IBM Almaden Research Ctr. (USA) )
- Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) )
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 1
- Page(from):
- 464
- Page(to):
- 472
- Pages:
- 9
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
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