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Optimization of align marks and overlay targets in VIA first dual damascene process

Author(s):
Shin, D.-U. ( Hynix Semiconductor Inc. (South Korea) )
Jeong, Y.-B. ( Hynix Semiconductor Inc. (South Korea) )
Park, J.-L. ( Hynix Semiconductor Inc. (South Korea) )
Choi, J.-S. ( Hynix Semiconductor Inc. (South Korea) )
Lee, J.-G. ( Hynix Semiconductor Inc. (South Korea) )
Lee, D.-H. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
415
Page(to):
427
Pages:
13
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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