Challenges of image placement and overlay at the 90-nm and 65-nm nodes

Challenges of image placement and overlay at the 90-nm and 65-nm nodes

Author(s):: Trybula, W.J. ( International SEMATECH (USA) )
Publication title:: Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5038
Pub. Year:: 2003
Vol.:: 1
Page(from):: 286
Page(to):: 292
Pages:: 7
Pub. info.:: Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819448439 [0819448435]
Language:: English
Call no.:: P63600/5038
Type:: Conference Proceedings

Details

TDL ID:	ZA00013025
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2003 : 17th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.24-2003.02.27
Note for article:	Mask-Related Metrology ; 5038-29

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