Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.
- Author(s):
Jones, R.L. ( National Institute of Standards and Technology (USA) ) Hu, T. ( National Institute of Standards and Technology (USA) ) Lin, E.K. ( National Institute of Standards and Technology (USA) ) Wu, W. ( National Institute of Standards and Technology (USA) ) Casa, D.M. ( Argon National Lab. (USA) ) Orji, N.G. ( National Institute of Standards and Technology (USA) ) Vorburger, T.V. ( National Institute of Standards and Technology (USA) ) Bolton, P.J. ( Shipley Co. LLC (USA) ) Barclay, G.G. ( Shipley Co. LLC (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 1
- Page(from):
- 191
- Page(to):
- 199
- Pages:
- 9
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
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