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Scatterometry-based overlay metrology

Author(s):
Huang, H.-T. ( Therma-Wave, Inc. (USA) )
Raghavendra, G. ( Therma-Wave, Inc. (USA) )
Sezginer, A. ( Therma-Wave, Inc. (USA) )
Johnson, K. ( Therma-Wave, Inc. (USA) )
Stanke, F.E. ( Therma-Wave, Inc. (USA) )
Zimmerman, M.L. ( Therma-Wave, Inc. (USA) )
Cheung, C. ( Advanced Micro Devices, Inc. (USA) )
Miyagi, M. ( Tokyo Electron Texas (USA) )
Singh, B. ( Advanced Micro Devices, Inc. (USA) )
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
126
Page(to):
137
Pages:
12
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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