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Application of simulation-based defect printability analysis at mask qualification control

Author(s):
  • Lu, J. ( Semiconductor Manufacturing International Corp. (China) )
  • Lu, A. ( Semiconductor Manufacturing International Corp. (China) )
  • Pang, L. ( Numerical Technologies, Inc. (Taiwan) )
  • Lee, D. ( Numerical Technologies, Inc. (Taiwan) )
  • Chen, J. ( Numerical Technologies, Inc. (Taiwan) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
33
Page(to):
40
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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