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Advances in CPL, collimated plasma source and full field exposure for sub-100-nm lithography

Author(s):
Boerger, B.E. ( JMAR/SAL Nanolithography (USA) )
McLeod, S. ( JMAR/SAL Nanolithography (USA) )
Forber, R.A. ( JMAR Research, Inc. (USA) )
Turcu, I.C.E. ( JMAR Research, Inc. (USA) )
Gaeta, C.J. ( JMAR Research, Inc. (USA) )
Bailey, D.K. ( JMAR/SAL Nanolithography (USA) )
Ben-Jacob, J. ( JMAR/SAL Nanolithography (USA) )
2 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1112
Page(to):
1122
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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