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Predicting local thermomechanical distortions of the 200-mm EPL mask system

Author(s):
Lee, P.-T. ( Univ. of Wisconsin/Madison (USA) )
Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )
Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )
Kawata, S. ( Nikon Corp. (Japan) )
Hirayanagi, N. ( Nikon Corp. (Japan) )
Sogard, M.R. ( Nikon Research Corp. of America (USA) )
1 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1009
Page(to):
1018
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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