Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication
- Author(s):
- Lu, B. ( Motorola, Inc. (USA) )
- Weisbrod, E. ( Motorola, Inc. (USA) )
- Mangat, P.J.S. ( Motorola, Inc. (USA) )
- Nordquist, K.J. ( Motorola, Inc. (USA) )
- Ainley, E.S. ( Motorola, Inc. (USA) )
- Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 952
- Page(to):
- 961
- Pages:
- 10
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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