Blank Cover Image

Improvement of the resist pattern collapse

Author(s):
Watanabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Tomo, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kiba, Y. ( Tokyo Electron Kyushu Ltd. (Japan) )
Tanaka, K. ( Tokyo Electron Kyushu Ltd. (Japan) )
Naito, R. ( Tokyo Electron Kyushu Ltd. (Japan) )
1 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
925
Page(to):
933
Pages:
9
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Improvement of pattern collapse issue by additive-added D.I. water rinse process

Tanaka, K., Naito, R., Kitada, T., Kiba, Y., Yamada, Y., Kobayashi, M., Ichikawa, H.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Resolution limit in character projection e-beam system

Tomo,Y., Matsuoka,K., Kojima,Y., Yoshida,A., Shimizu,I., Yamabe,M.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Defect printability analysis on electron projection lithography with diamond stencil reticle

Tomo, Y., Kojima, Y., Shimizu, S., Watanabe, M., Takenaka, H., Yamashita, H., Iwasaki, T., Takahashi, K., Yamabe, M.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Dynamic image placement accuracy of a stencil mask

Takenaka, H., Yamashita, H., Takahashi, K., Tomo, Y., Watanabe, M., Iwasaki, T., Yamamoto, J., Yamabe, M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Improvement of pattern collapse issue by additive-added D.I water rinse process: II

Miyahara, O., Tanaka, K., Wakamizu, S., Kitano, J., Yamada, Y.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Defect printability of hole pattern on electron projection lithography

Yamamoto, J., Tomo, Y., Shimizu, S., Iwasaki, T., Yamabe, M.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Simulation of complex resist pattern collapse with mechanical modeling

Lee, H.-J., Park, J.-T., Kwon, Y.-K., Oh, H.-K.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Hwang, Y.-S., Jung, J.-C., Park, K.-D., Lee, S.-K., Kim, J.-S., Kong, K.-K., Shin, K.-S., Ding, S.-J., Xiang, Z., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Fine-pattern process with negative tone resist

Hoshino,E., Uraguchi,M., Yamamoto,Y., Sato,Y., Minagawa,K., Suzuki,K., Watanabe,K.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Masuda, S., Kobayashi, M., Kim, W.-K., Anyadiegwu, C., Padmanaban, M., Dammel, R.R., Tanaka, K., Yamada, Y.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Improvement of the external extraction efficiency of OLED by using a pyramid array

Tanaka, S., Kawakami, Y., Naito, Y.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12