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Supercritical resist dry technique for electron-beam projection lithography (EPL)

Author(s):
Petricich, G. ( DNS Electronics, LLC (USA) )
Suzuki, K. ( Kobelco Research Institute, Inc. (Japan) )
Munemasa, J. ( Kobe Steel, Ltd. (Japan) )
Yoshikawa, T. ( Kobe Steel, Ltd. (Japan) )
Kawakami, N. ( Kobe Steel, Ltd. (Japan) )
Shimizu, S. ( Nikon Corp. (Japan) )
Watanabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
2 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
917
Page(to):
924
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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