Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling
- Author(s):
Robertson, S.A. ( Shipley Co. L.L.C. (USA) ) Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) ) O'Connell, D.J. ( Sandia National Labs. (USA) ) McDonald, K. ( Sandia National Labs. (USA) ) Delano, T.M. ( Shipley Co. (USA) ) Goldberg, K.A. ( Lawrence Berkeley National Lab. (USA) ) Hansen, S.G. ( ASML (USA) ) Brown, K.W. ( Shipley Co. L.L.C. (USA) ) Brainard, R.L. ( Shipley Co. L.L.C. (USA) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 900
- Page(to):
- 909
- Pages:
- 10
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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