Estimation-EUV mask flatness for allowable pattern shift

Estimation-EUV mask flatness for allowable pattern shift

Author(s):

Chiba, A. ( Association of Super-Advanced Electronics Technologies (Japan) )
Sugawara, M. ( Association of Super-Advanced Electronics Technologies (Japan) )
Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

2

Pt.:

Poster Session

Page(from):

841

Page(to):

849

Pages:

9

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Poster Session ; 5037-103

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