Performance and scaling of a dense plasma focus light source for EUV lithography
- Author(s):
Fomenkov, I.V. ( Cymer, Inc. (USA) ) Ness, R.M. ( Cymer, Inc. (USA) ) Oliver, I.R. ( Cymer, Inc. (USA) ) Melnychuk, S.T. ( Cymer, Inc. (USA) ) Khodykin, O.V. ( Cymer, Inc. (USA) ) Boewering, N.R. ( Cymer, Inc. (USA) ) Rettig, C.L. ( Cymer, Inc. (USA) ) Hoffman, J.R. ( Cymer, Inc. (USA) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 807
- Page(to):
- 821
- Pages:
- 15
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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