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High-conversion-efficiency tin material laser-plasma source for EUVL

Author(s):
Koay, C.-S. ( CREOL/Univ. of Central Florida (USA) )
Keyser, C.K. ( CREOL/Univ. of Central Florida (USA) )
Takenoshita, K. ( CREOL/Univ. of Central Florida (USA) )
Fujiwara, E. ( CREOL/Univ. of Central Florida (USA) )
Al-Rabban, M.M. ( CREOL/Univ. of Central Florida (USA) )
Richardson, M.C. ( CREOL/Univ. of Central Florida (USA) )
Turcu, I.C.E. ( JMAR Technologies Inc. (USA) )
Rieger, H. ( JMAR Technologies Inc. (USA) )
Stone, A. ( JMAR Technologies Inc. (USA) )
Morris, J.H. ( JMAR Technologies Inc. (USA) )
5 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
801
Page(to):
806
Pages:
6
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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