Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
- Author(s):
Teramoto, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Sato, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Bessho, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Miyauchi, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Ikeuchi, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Okubo, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Yoshioka, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Toyoda, K. ( Tokyo Univ. of Science (Japan) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 767
- Page(to):
- 775
- Pages:
- 9
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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