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Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography

Author(s):
Teramoto, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Sato, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Bessho, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Miyauchi, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Ikeuchi, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Okubo, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Yoshioka, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Toyoda, K. ( Tokyo Univ. of Science (Japan) )
3 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
767
Page(to):
775
Pages:
9
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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