Debris-free EUV source using a through-hole tin target
- Author(s):
Ueno, Y. ( Association of Super-Advanced Electronics Technologies (Japan) ) Aota, T. ( Japan Society for the Promotion of Science (Japan) ) Niimi, G. ( National Institute of Advanced Industrial Science and Technology (Japan) ) Lee, D.-H. ( National Institute of Advanced Industrial Science and Technology (Japan) ) Nishigori, K. ( National Institute of Advanced Industrial Science and Technology (Japan) ) Yashiro, H. ( National Institute of Advanced Industrial Science and Technology (Japan) ) Tomie, T. ( National Institute of Advanced Industrial Science and Technology (Japan) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 750
- Page(to):
- 758
- Pages:
- 9
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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