Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

Author(s):

Pain, L. ( CEA-LETI (France) )

Charpin, M. ( CEA-LETI (France) )

Laplanche, Y. ( STMicroelectronics (France) )

Herisson, D. ( STMicroelectronics (France) )

Todeschini, J. ( Philips Semiconductors (France) )

Palla, R. ( STMicroelectronics (France) )

Beverina, A. ( STMicroelectronics (France) )

Leininger, H. ( STMicroelectronics (France) )

Tourniol, S. ( STMicroelectronics (France) )

Broekaart, M. ( Philips Semiconductors (France) )

Luce, E. ( STMicroelectronics (France) )

Judong, F. ( STMicroelectronics (France) )

Brosselin, K. ( STMicroelectronics (France) )

Friec, Y.Le. ( STMicroelectronics (France) )

Leverd, F. ( STMicroelectronics (France) )

Medico, S.D. ( STMicroelectronics (France) )

Jonghe, V.D. ( Philips Semiconductors (France) )

Henry, D. ( STMicroelectronics (France) )

Woo, M.P. ( Motorola (France) )

Arnaud, F. ( STMicroelectronics (France) )

15 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 15

Page(from):

560

Page(to):

571

Pages:

12

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 15. E-Beam Direct Write/Maskless ; 5037-71

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