Estimated impact of shot noise in extreme-ultraviolet lithography

Estimated impact of shot noise in extreme-ultraviolet lithography

Author(s):

Cobb, J.L. ( Motorola, Inc. (USA) )
Houle, F.A. ( IBM Almaden Research Ctr. (USA) )
Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 11

Page(from):

397

Page(to):

405

Pages:

9

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 11. Emerging Resist Technology ; 5037-52

Similar Items:

1 Conference Proceedings Extendibility of chemically amplified resists: another brick wall? (Invited Paper) Hinsberg, W.D., Houle, F.A., Sanchez, M.I., Hoffnagle, J.A., Wallraff, G.M., Medeiros, D.R., Gallatin, G.M., Cobb, J.L. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection Han, S.-I., Wasson, J.R., Mangat, P.J.S., Cobb, J.L., Lucas, K., Hector, S.D. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Continuum model of shot noise and line edge roughness Gallatin,G.M. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Liquid immersion lithography: evaluation of resist issues Hinsberg, W., Wallraff, G.M., Larson, C.E., Davis, B.W., Deline, V., Raoux, S., Miller, D., Houle, F.A., Hoffnagle, J., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings EUV photoresist performance results from the VNL and the EUV LLC Cobb, J.L., Dentinger, P.M., Hunter, L.L., O'Connell, D.J., Gallatin, G.M., Hinsberg, W.D., Houle, F.A., Sanchez, M.I., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Power scale-up of the extreme-ultraviolet electric capillary discharge source Fornaciari, N.R., Bender, H., Buchenauer, D., Dimkoff, J.L., Kanouff, M.P., Karim, S., Romeo, C., Shimkaveg, G.M., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Fast calculation of images for high numerical aperture lithography Rosenbluth, A.E., Gallatin, G.M., Gordon, R.L., Hinsberg, W., Hoffnagle, J., Houle, F., Lai, K., Lvov, A., Sanchez, M., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Kinetics of chemically amplified resists G.M. Wallraff, W.D. Hinsberg, F.A. Houle, J. Opitz, D. Hopper Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Masks for extreme ultraviolet lithography Vernon,S.P., Kearney,P.A., Tong,W.M., Prisbrey,S., Larson,C., Moore,C.E., Weber,F.J., Cardinale,G.F., Yan,P., … SPIE - The International Society for Optical Engineering	11 Conference Proceedings High-reflectance coatings and materials for the extreme ultraviolet R.A. Keski-Kuha, J.F. Osantowski, G.M. Blumenstock, J.S. Gum, C.M. Fleetwood Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Assessing the impact of intrinsic birefringence on 157-nm lithography Seong, N., Lai, K., Rosenbluth, A.E., Gallatin, G.M. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Shot-noise impact on resist roughness in EUV lithography Hutchinson,J.M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12