Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
- Author(s):
Thiel, C. ( IBM Microelectronics Div. (USA) ) Racette, K.C. ( IBM Microelectronics Div. (USA) ) Fisch, E. ( IBM Microelectronics Div. (USA) ) Lawliss, M. ( IBM Microelectronics Div. (USA) ) Kindt, L. ( IBM Microelectronics Div. (USA) ) Huang, C. ( IBM Microelectronics Div. (USA) ) Ackel, R. ( IBM Microelectronics Div. (USA) ) Levy, M. ( IBM Microelectronics Div. (USA) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 9
- Page(from):
- 339
- Page(to):
- 346
- Pages:
- 8
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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