Blank Cover Image

Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks

Author(s):
Thiel, C. ( IBM Microelectronics Div. (USA) )
Racette, K.C. ( IBM Microelectronics Div. (USA) )
Fisch, E. ( IBM Microelectronics Div. (USA) )
Lawliss, M. ( IBM Microelectronics Div. (USA) )
Kindt, L. ( IBM Microelectronics Div. (USA) )
Huang, C. ( IBM Microelectronics Div. (USA) )
Ackel, R. ( IBM Microelectronics Div. (USA) )
Levy, M. ( IBM Microelectronics Div. (USA) )
3 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
1
Pt.:
Session 9
Page(from):
339
Page(to):
346
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

Similar Items:

Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J.

SPIE-The International Society for Optical Engineering

Racette,K.C., Williams,C.T., Lercel,M.J.

SPIE-The International Society for Optical Engineering

Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C.

SPIE-The International Society for Optical Engineering

Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., …

SPIE - The International Society for Optical Engineering

Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L.

SPIE-The International Society for Optical Engineering

9 Conference Proceedings Image placement distortions in EPI masks

Thiel, C.W., Kindt, L., Lawliss, M.

SPIE-The International Society for Optical Engineering

4 Conference Proceedings EUVL mask fabrication for the 45-nm node

Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T.

SPIE-The International Society for Optical Engineering

Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L.

SPIE - The International Society for Optical Engineering

5 Conference Proceedings EPL mask fabrication

Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E.

SPIE-The International Society for Optical Engineering

Tong,W.M., Taylor,J.S., Hector,S.D., Shell,M.K

SPIE - The International Society for Optical Engineering

Walton,C.C., Kearney,P.A., Mirkarimi,P.B., Bowers,J.M., Cerjan,C.J., Warrick,A.L., Wilhelmsen,K.C., Fought,E.R., …

SPIE - The International Society for Optical Engineering

12 Conference Proceedings Masks for extreme ultraviolet lithography

Vernon,S.P., Kearney,P.A., Tong,W.M., Prisbrey,S., Larson,C., Moore,C.E., Weber,F.J., Cardinale,G.F., Yan,P., …

SPIE - The International Society for Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12