Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Author(s):

Deng, Y. ( Univ. of California/Berkeley (USA) )
Fontaine, B.M.L. ( Advanced Micro Devices, Inc. (USA) )
Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
Neureuther, A.R. ( Univ. of California/Berkeley (USA) )

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 9

Page(from):

302

Page(to):

313

Pages:

12

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 9. Advanced Masks I ; 5037-41

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