Improved materials meeting the demands for EUV substrates

Improved materials meeting the demands for EUV substrates

Author(s):

Mitra, I. ( Schott Glas (Germany) )

Alkemper, J. ( Schott Glas (Germany) )

Nolte, U. ( Schott Glas (Germany) )

Engel, A. ( Schott Glas (Germany) )

Mueller, R. ( Schott Glas (Germany) )

Ritter, S. ( Schott Glas (Germany) )

Hack, H. ( Schott Glas (Germany) )

Megges, K. ( Schott Glas (Germany) )

Kohlmann, H. ( Schott Glas (Germany) )

Pannhorst, W. ( Schott Glas (Germany) )

Davis, M.J. ( Schott Glass Technologies Inc. (USA) )

Aschke, L. ( Schott Lithotec AG (Germany) )

Knapp, K. ( Schott Lithotec AG (Germany) )

8 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 7

Page(from):

219

Page(to):

226

Pages:

8

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 7. EUV Materials and Multilayers ; 5037-31

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