Advances in Step and Flash imprint lithography

Advances in Step and Flash imprint lithography

Author(s):

Johnson, S.C. ( Univ. of Texas at Austin (USA) )

Bailey, T.C. ( Univ. of Texas at Austin (USA) )

Dickey, M.D. ( Univ. of Texas at Austin (USA) )

Smith, B.J. ( Univ. of Texas at Austin (USA) )

Kim, E.K. ( Univ. of Texas at Austin (USA) )

Jamieson, A.T. ( Univ. of Texas at Austin (USA) )

Stacey, N.A. ( Univ. of Texas at Austin (USA) )

Ekerdt, J.G. ( Univ. of Texas at Austin (USA) )

Willson, C.G. ( Univ. of Texas at Austin (USA) )

Mancini, D.P. ( Motorola, Inc. (USA) )

Dauksher, W.J. ( Motorola, Inc. (USA) )

Nordquist, K.J. ( Motorola, Inc. (USA) )

Resnick, D.J. ( Motorola, Inc. (USA) )

8 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 6

Page(from):

197

Page(to):

202

Pages:

6

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 6. Nanoimprint Lithography I ; 5037-28

Similar Items:

1 Conference Proceedings Imprint lithography: lab curiosity or the real NGL (Keynote Address) Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Bailey, T.C., Johnson, S.C., Stacey, N.A., Ekerdt, J.G., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE - The International Society of Optical Engineering
2 Conference Proceedings High-resolution templates for step and flash imprint lithography Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography Mancini, D.P., Le, N., Gehoski, K.A., Young, S., Dauksher, W.J., Nordquist, K.J., Resnick, D.J. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device Smith, B.J., Stacey, N.A., Donnelly, J.P., Onsongo, D.M., Bailey, T.C., Mackay, C.J., Resnick, D.J., Dauksher, W.J., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Step and flash imprint lithography for sub-100-nm patterning Colburn,M., Grot,A., Amistoso,M.N., Choi,B.J., Bailey,T.C., Ekerdt,J.G., Sreenivasan,S.V., Hollenhorst,J., Willson,C.G. SPIE - The International Society for Optical Engineering
4 Conference Proceedings New methods for fabricating step and flash imprint lithography templates Resnick, D.J., Bailey, T.C., Mancini, D.P., Nordquist, K.J., Dauksher, W.J., Ainley, E.S., Talin, A., Gehoski, K.A., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Critical dimension and image placement issues for step and flash imprint lithography templates Nordquist, K.J., Mancini, D.P., Dauksher, W.J., Ainley, E.S., Gehoski, K.A., Resnick, D.J., Masnyj, Z.S., Mangat, P.J.S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Mesoscale modeling for SFIL simulating polymerization kinetics and densification Burns, R.L., Johnson, S.C., Schmid, G.M., Kim, E.K., Dickey, M.D., Meiring, J., Burns, S.D., Stacey, N.A., Willson, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Layer-to-layer alignment for step and flash imprint lithography Choi,B.J., Meissl,M.J., Colbrun,M., Bailey,T.C., Ruchhoeft,P., Sreenivasan,S.V., Prins,F., Banerjee,S.K., Ekerdt,J.G., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Analysis of critical dimension uniformity for Step and Flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Step and flash imprint lithography:a new approach to high-resolution patterning Colburn,M., Johnson,S., Stewart,M., Damle,S., Bailey,T.C., Choi,B., Wedlake,M., Michaelson,T., Sreenivasan,S.V., … SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12