Analysis of critical dimension uniformity for Step and Flash imprint lithography

Analysis of critical dimension uniformity for Step and Flash imprint lithography

Author(s):

Mancini, D.P. ( Motorola, Inc. (USA) )

Gehoski, K.A. ( Motorola, Inc. (USA) )

Dauksher, W.J. ( Motorola, Inc. (USA) )

Nordquist, K.J. ( Motorola, Inc. (USA) )

Resnick, D.J. ( Motorola, Inc. (USA) )

Schumaker, P. ( Molecular Imprints, Inc. (USA) )

McMackin, I. ( Molecular Imprints, Inc. (USA) )

2 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 6

Page(from):

187

Page(to):

196

Pages:

10

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 6. Nanoimprint Lithography I ; 5037-27

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