Blank Cover Image

Design and performance of a step and repeat imprinting machine

Author(s):
McMackin, I. ( Molecular Imprints, Inc. (USA) )
Schumaker, P. ( Molecular Imprints, Inc. (USA) )
Babbs, D. ( Molecular Imprints, Inc. (USA) )
Choi, J. ( Molecular Imprints, Inc. (USA) )
Collison, W. ( Lam Research Corp. (USA) )
Sreenivasan, S.V. ( Molecular Imprints, Inc. (USA) )
Schumaker, N.E. ( Molecular Imprints, Inc. (USA) )
Watts, M.P.C. ( Molecular Imprints, Inc. (USA) )
Voisin, R.D. ( Molecular Imprints, Inc. (USA) )
4 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
1
Pt.:
Session 6
Page(from):
178
Page(to):
186
Pages:
9
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Step and Repeat UV nanoimprint lithography tools and processes

McMackin, I., Choi, J., Schumaker, P., Nguyen, V., Xu, F., Thompson, E., Babbs, D., Sreenivasan, S.V., Watts, M., …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings High-resolution templates for step and flash imprint lithography

Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Development of imprint materials for the Step and Flash Imprint Lithography process

Xu, F., Stacey, N.A., Watts, M., Truskett, V., McMackin, I., Choi, J., Schumaker, P., Thompson, E., Babbs, D., …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings New methods for fabricating step and flash imprint lithography templates

Resnick, D.J., Bailey, T.C., Mancini, D.P., Nordquist, K.J., Dauksher, W.J., Ainley, E.S., Talin, A., Gehoski, K.A., …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Cost of ownership analysis for patterning using step and flash imprint lithography

Sreenivasan, S.V., Willson, C.G., Schumaker, N.E., Resnick, D.J.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Sub-50 nm Imprint Lithography for Wafer-Scale Nano-Manufacturing

V.N. Truskett, F. Xu, I. McMackin, J. Choi, P. Schumaker

American Institute of Chemical Engineers
4 Conference Proceedings Low-cost nanostructure patterning using step and flash imprint lithography

Sreenivasan, S.V., Willson, C.G., Schumaker, N.E., Resnick, D.J.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Sub-50 nm Imprint Lithography for Wafer-Scale Nano-Manufacturing

V.N. Truskett, F. Xu, I. McMackin, J. Choi, P. Schumaker

American Institute of Chemical Engineers
5 Conference Proceedings Fabrication of Step and Flash imprint lithography templates using commercial mask processes

Thompson, E., Rhyins, P.D., Voisin, R.D., Sreenivasan, S.V., Martin, P.M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device

Smith, B.J., Stacey, N.A., Donnelly, J.P., Onsongo, D.M., Bailey, T.C., Mackay, C.J., Resnick, D.J., Dauksher, W.J., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Imprint lithography: lab curiosity or the real NGL (Keynote Address)

Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Bailey, T.C., Johnson, S.C., Stacey, N.A., Ekerdt, J.G., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Step and flash imprint lithography for sub-100-nm patterning

Colburn,M., Grot,A., Amistoso,M.N., Choi,B.J., Bailey,T.C., Ekerdt,J.G., Sreenivasan,S.V., Hollenhorst,J., Willson,C.G.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12