Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Author(s):

Bauer, B.S. ( Univ. of Nevada/Reno (USA) )

Esaulov, A. ( Univ. of Nevada/Reno (USA) )

Makhin, V. ( Univ. of Nevada/Reno (USA) )

Mancini, R.C. ( Univ. of Nevada/Reno (USA) )

Paraschiv, I. ( Univ. of Nevada/Reno (USA) )

Presura, R. ( Univ. of Nevada/Reno (USA) )

Lindemuth, I.R. ( Los Alamos National Lab. (USA) )

Sheehey, P.T. ( Los Alamos National Lab. (USA) )

Rice, B.J. ( Intel Corp. (USA) )

4 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 4

Page(from):

130

Page(to):

140

Pages:

11

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 4. EUV Sources I ; 5037-17

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