High-power EUV lithography sources based on gas discharges and laser-produced plasmas

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

Author(s):

Stamm, U. ( XTREME technologies GmbH (Germany) )

Ahmad, I. ( XTREME technologies GmbH (Germany) )

Balogh, I. ( XTREME technologies GmbH (Germany) )

Birner, H. ( XTREME technologies GmbH (Germany) )

Bolshukhin, D. ( XTREME technologies GmbH (Germany) )

Brudermann, J. ( XTREME technologies GmbH (Germany) )

Enke, S. ( XTREME technologies GmbH (Germany) )

Flohrer, F. ( XTREME technologies GmbH (Germany) )

Goebel, K. ( XTREME technologies GmbH (Germany) )

Goetze, S. ( XTREME technologies GmbH (Germany) )

Hergenhan, G. ( XTREME technologies GmbH (Germany) )

Kleinschmidt, J. ( XTREME technologies GmbH (Germany) )

Kloepfel, D. ( XTREME technologies GmbH (Germany) )

Korobotchko, V. ( XTREME technologies GmbH (Germany) )

Ringling, J. ( XTREME technologies GmbH (Germany) )

Schriever, G. ( XTREME technologies GmbH (Germany) )

Tran, C.D. ( XTREME technologies GmbH (Germany) )

Ziener, C. ( XTREME technologies GmbH (Germany) )

13 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 4

Page(from):

119

Page(to):

129

Pages:

11

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 4. EUV Sources I ; 5037-16

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