Lithographic flare measurements of EUV full-field projection optics

Lithographic flare measurements of EUV full-field projection optics

Author(s):

Lee, S.H. ( Intel Corp. (USA) )

Naulleau, P. ( Lawrence Berkeley National Lab. (USA) )

Krautschik, C. ( Intel Corp. (USA) )

Chandhok, M. ( Intel Corp. (USA) )

Chapman, H.N. ( Lawrence Livermore National Lab. (USA) )

O'Connell, D.J. ( Sandia National Labs. (USA) )

Goldstein, M. ( Intel Corp. (USA) )

2 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 3

Page(from):

103

Page(to):

111

Pages:

9

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 3. EUV Optics and Image Quality ; 5037-13

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