Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Author(s):

Oshino, T. ( Nikon Corp. (Japan) )

Shiraishi, M. ( Nikon Corp. (Japan) )

Kandaka, N. ( Nikon Corp. (Japan) )

Sugisaki, K. ( Nikon Corp. (Japan) )

Kondo, H. ( Nikon Corp. (Japan) )

Ota, K. ( Nikon Corp. (Japan) )

Mashima, K. ( Nikon Corp. (Japan) )

Murakami, K. ( Nikon Corp. (Japan) )

Oizumi, H. ( Association of Super-Advanced Electronics Technologies (Japan) )

Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )

Okazaki, S. ( Association of Super-Advanced Electronics Technologies (Japan) )

6 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 3

Page(from):

75

Page(to):

82

Pages:

8

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings