Static EUV micro-exposures using the ETS Set-2 optics

Static EUV micro-exposures using the ETS Set-2 optics

Author(s):

Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) )

Goldberg, K.A. ( Lawrence Berkeley National Lab. (USA) )

Anderson, E.H. ( Lawrence Berkeley National Lab. (USA) )

Bokor, J. ( Lawrence Berkeley National Lab. (USA) )

Harteneck, B.D. ( Lawrence Berkeley National Lab. (USA) )

Jackson, K.H. ( Lawrence Berkeley National Lab. (USA) )

Olynick, D.L. ( Lawrence Berkeley National Lab. (USA) )

Salmassi, F. ( Lawrence Berkeley National Lab. (USA) )

Baker, S.L. ( Lawrence Livermore National Lab. (USA) )

Mirkarimi, P.B. ( Lawrence Livermore National Lab. (USA) )

Spiller, E.A. ( Lawrence Livermore National Lab. (USA) )

Walton, C.C. ( Lawrence Livermore National Lab. (USA) )

O'Connell, D.J. ( Sandia National Labs. (USA) )

Yan, P.-Y. ( Intel Corp. (USA) )

Zhang, G. ( Intel Corp. (USA) )

10 more

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 2

Page(from):

36

Page(to):

46

Pages:

11

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 2. EUV Systems/Overview ; 5037-05

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