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Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides

Author(s):
Pellens, R.J.M. ( ASML Special Applications (Netherlands) )
Klaveren, A. ( ASML Special Applications (Netherlands) )
Voets, R. ( ASML Special Applications (Netherlands) )
Heuvel, J.-P. ( ASML Special Applications (Netherlands) )
Misat, S. ( Arch Chemicals N.V. (Belgium) )
Waterson, P.J. ( Arch Chemicals, Inc. (USA) )
Peterson, L.J. ( Arch Chemicals, Inc. (USA) )
2 more
Publication title:
MEMS/MOEMS: Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4945
Pub. Year:
2003
Page(from):
122
Page(to):
129
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819447401 [0819447404]
Language:
English
Call no.:
P63600/4945
Type:
Conference Proceedings

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