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Nickel nanoparticles dispersed in SiO2 fabricated by high-flux negative-ion implantation of 60 keV

Author(s):
Amekura, H. ( National Institute for Materials Science (Japan) )
Kitazawa, H. ( National Institute for Materials Science (Japan) )
Mochiku, T. ( National Institute for Materials Science (Japan) )
Umeda, N. ( Univ. of Tsukuba (Japan) )
Takeda, Y. ( National Institute for Materials Science (Japan) )
Kishimoto, N. ( National Institute for Materials Science (Japan) )
1 more
Publication title:
Nano- and Microtechnology: Materials, Processes, Packaging, and Systems
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4936
Pub. Year:
2002
Page(from):
1
Page(to):
8
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819447319 [0819447315]
Language:
English
Call no.:
P63600/4936
Type:
Conference Proceedings

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