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Application of High Temperature-Pressure Treatment for Investigation of Defect Creation in Basic Materials of Modern Microelectronics: Czochralski Silicon and Silicon Containing Films

Author(s):
Misiuk, A.  
Publication title:
Frontiers of high pressure research II: application of high pressure to low-dimensional novel electronic materials
Title of ser.:
NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.:
48
Pub. Year:
2001
Page(from):
275
Page(to):
290
Pages:
16
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISBN:
9781402001598 [1402001592]
Language:
English
Call no.:
N17050/48
Type:
Conference Proceedings

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