ECR Plasma Etching of GaAs in CCI2F2/Ar Discharge
- Author(s):
- Publication title:
- Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001)
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4746
- Pub. Year:
- 2002
- Vol.:
- VOL-2
- Page(from):
- 1386
- Page(to):
- 1389
- Pages:
- 4
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445001 [0819445002]
- Language:
- English
- Call no.:
- P63600/4746
- Type:
- Conference Proceedings
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