Analytical approach to X-phenomenon in alternating phase-shifting masks
- Author(s):
Park, J.R. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, S.-H. Lee, H.-J. Jang, I.-Y. Choi, Y.-H. Yang, S.-H. Lee, Y.-H. Kim, Y.-H. Choi, S.-W. Yoon, H.-S. Sohn, J.-M. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1209
- Page(to):
- 1216
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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