PSM defect printability of extremely low-k1 sub-130-nm KrF lithography
- Author(s):
- Cho, W.-I. ( Samsung Electronics Co., Ltd. (South Korea) )
- Yeo, G.
- Moon, S.-Y.
- Yoon, H.-S.
- Sohn, J.-M.
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1202
- Page(to):
- 1208
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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