Complementary double-exposure technique (CODE) solutions to the two-dimensional structures of 90-nm node

Complementary double-exposure technique (CODE) solutions to the two-dimensional structures of 90-nm node

Author(s):

Manakil, S. ( STMicroelectronics (France) and Lab. des Technologies et de la Microelectronique (France) )

Troullier, Y. ( CEA-LETI (France) )

Toublan, O. ( Mentor Graphics Ltd. (France) )

Schiavone, P. ( Lab. Des Technologies et de la Microelectronique (France) )

Rody, Y.F. ( Philips Research Labs. (France) )

Goirand, P.J. ( STMicrolectronics (France) )

1 more

Publication title:

22nd Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4889

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1181

Page(to):

1188

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

Language:

English

Call no.:

P63600/4889

Type:

Conference Proceedings

Details

TDL ID:	ZA00012737
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	22nd
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2002.10.01-2002.10.04

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