Critical dimension and image placement issues for step and flash imprint lithography templates
- Author(s):
Nordquist, K.J. ( Motorola, Inc. (USA) ) Mancini, D.P. Dauksher, W.J. Ainley, E.S. Gehoski, K.A. Resnick, D.J. Masnyj, Z.S. Mangat, P.J.S. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1143
- Page(to):
- 1149
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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