Image placement distortions in EPI masks
- Author(s):
- Thiel, C.W. ( IBM Microelectronics Div. (USA) )
- Kindt, L.
- Lawliss, M.
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1133
- Page(to):
- 1142
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
X-ray mask image-placement studies at the Microlithography Mask Development Center
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Evaluation of image-placement distortion contributors of the EL-3+ electron-beam lithography system in x-ray mask fabrication
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Next-generation lithography mask development at the NGL Mask Center of Competency
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Placement measurement and FE modeling results for distortion control of stencil masks
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |