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Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks

Author(s):
Kim, W.D. ( Texas Instruments Inc. (USA) )
Akima, S. ( Toppan Printing Co., Ltd. (Japan) )
Aquino, C.M. ( KLA-Tencor Corp. (USA) )
Becker, C.
Eickhotf, M.D.
Narita, T. ( Toppan Printing Co., Ltd. (Japan) )
Quah, S.-K. ( Texas Instruments Inc. (USA) )
Rohr, P.M.
Schlaffer, R. ( KLA-Tencor Corp. (USA) )
Tanzawa, J. ( Toppan Printing Co., Ltd. (Japan) )
Yamada, Y.
6 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part Two
Page(from):
972
Page(to):
983
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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