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Advanced CD linearity improvement for multiproject wafers and SoC at 95-nm technology node

Author(s):
Lu, J. ( Photronics-PSMC (Taiwan) )
Sandlin, N.L. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
Sato, H. ( Hitachi High-Technologies Co. (Japan) )
Lu, C. ( Photronics-PSMC (Taiwan) )
Cheng, N.
Huang, T.
Su, C.
Buie, M.J. ( Etec Systems, Inc., An Applied Materials Co. (USA) )
3 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part Two
Page(from):
800
Page(to):
808
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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