Laser PG performance for 100-nm photomasks
- Author(s):
Rosling, M. ( Micronic Laser Systems AB (Sweden) ) Karawajczyk, A. Askebjer, P. Zerne, R. Carroll, A.M. Eklund, R. Fosshaug, H. Sandstrom, T. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 759
- Page(to):
- 766
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement …
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Improved photomask accuracy with a high-productivity DUV laser pattern generator [6349-34]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Printing sub-100-nm random logic patterns using binary masks and synthetic-aperture lithography (SAL)
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Sigma7500: an improved DUV laser pattern generator addressing sub-100 nm photomask accuracy and productivity requirements [6283-03]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |