Novel resist development system for photomasks
- Author(s):
- Itoh, M. ( Toshiba Corp. (Japan) )
- Sakurai, H.
- Esaki, Y. ( Tokyo Electron Kyushu Ltd. (Japan) )
- Ooishi, K.
- Sakamoto, K.
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 746
- Page(to):
- 753
- Pages:
- 8
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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