Improvement of NLD mask dry etching system for 100-nm-node technology
- Author(s):
Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Yoshioka, N. Harashima, N. ( ULVAC Coating Corp. (Japan) ) Sasaki, T. Kuwahara, K. ( ULVAC Inc. (Japan) ) Hayashi, T. Hara, M. ( HOYA Corp. (Japan) ) Ohkubo, Y. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 619
- Page(to):
- 625
- Pages:
- 7
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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