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Influence of the baking process for chemically amplified resist on CD performance

Author(s):
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Ohfuji, T. ( Intel K.K. (Japan) )
Kurihara, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Inomata, H.
Jackson, C.A. ( Intel Corp. (USA) )
Murata, Y. ( Intel. K.K. (Japan) )
Totsukawa, D. ( Dai Nippon Printing Co., Ltd. (Japan) )
Tsugama, N. ( Intel K.K. (Japan) )
Kitano, N.
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hwang, D.H. ( Intel Corp. (USA) )
6 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part One
Page(from):
599
Page(to):
606
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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