Application of Cr-less mask technology for sub-100-nm gate with single exposure
- Author(s):
Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chung, D.-H. Park, J.S.. Shin, I.K. Choi, S.W. Sohn, J.-M. Lee, J.-H. Shin, H.-S. Chen, J.F. ( ASML Masktools, Inc. (USA) ) Van Den Broeke, D.J. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 568
- Page(to):
- 578
- Pages:
- 11
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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