PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes - ArF, F2, or EPL? (Invited Paper)
- Author(s):
- Tanabe, H. ( Elpida Memory, Inc. (Japan) )
- Nagaoka, Y. ( KLA-Tencor Japan Ltd. (Japan) )
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 437
- Page(to):
- 449
- Pages:
- 13
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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