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Electron-beam-induced processes and their applicability to mask repair

Author(s):
Boegli, V.A. ( NaWoTec GmbH (USA) )
Koops, H.W.P.
Budach, M.
Edinger, K.
Hoinkis, O.
Weyrauch, B.
Becker, R.
Schmidt, R.
Kaya, A.
Reinhardt, A.
Brauuer, C.
Honold, H. ( LEO Elektronenmikroskopie GmbH (Germany) )
Bihr, J.
Greiser, J.
Eisenmann, M.
10 more
Publication title:
22nd Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4889
Pub. Year:
2002
Vol.:
Part One
Page(from):
283
Page(to):
292
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
Language:
English
Call no.:
P63600/4889
Type:
Conference Proceedings

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